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ion-implantation process

См. также в других словарях:

  • Ion implantation — is a materials engineering process by which ions of a material can be implanted into another solid, thereby changing the physical properties of the solid. Ion implantation is used in semiconductor device fabrication and in metal finishing, as… …   Wikipedia

  • ion implantation — Electronics. a method of implanting impurities below the surface of a solid, usually a semiconductor, by bombarding the solid with a beam of ions of the impurity. [1960 65] * * * ion implantation noun The introduction of ions into a crystalline… …   Useful english dictionary

  • Plasma-immersion ion implantation — (PIII) [cite book | title = Materials Science of Thin Films | author = Milton Ohring | publisher = Academic Press | year = 2002 | isbn = 0125249756 | url = http://books.google.com/books?id=SOt yFjV xwC pg=PA267… …   Wikipedia

  • double ion-implanted process — dvikartinis jonų implantavimas statusas T sritis radioelektronika atitikmenys: angl. double ion implanted process vok. Doppelimplantation, f rus. двухкратная ионная имплантация, f pranc. double implantation ionique, f …   Radioelektronikos terminų žodynas

  • Ion Beam Mixing — is a process for adhering two multilayers, especially a substrate and deposited surface layer. The process involves bombarding layered samples with doses of ion radiation in order to promote mixing at the interface, and generally serves as a… …   Wikipedia

  • Ion beam deposition — (IBD) is a process of applying materials to a target through the application of an ion beam.In an ion source source materials gases or evaporated solids are ionized using electron ionization or by application of high electric fields (Penning ion… …   Wikipedia

  • Ion beam assisted deposition — or IBAD or IAD (not to be confused with ion beam induced deposition, IBID) is a materials engineering technique which combines ion implantation with simultaneous sputtering or another physical vapor deposition technique. Besides providing… …   Wikipedia

  • Ion beam — An ion beam is a type of particle beam consisting of ions. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. Today s ion beam sources are typically derived from the mercury vapor thrusters… …   Wikipedia

  • Semiconductor process simulation — is the modeling of the fabrication of semiconductor devices such as transistors. It is a branch of electronic design automation, and part of a sub field known as technology CAD, or TCAD. 400px|right|thumb|This figure shows a result from… …   Wikipedia

  • double implantation ionique — dvikartinis jonų implantavimas statusas T sritis radioelektronika atitikmenys: angl. double ion implanted process vok. Doppelimplantation, f rus. двухкратная ионная имплантация, f pranc. double implantation ionique, f …   Radioelektronikos terminų žodynas

  • Deep reactive-ion etching — (DRIE) is a highly anisotropic etch process used to create deep penetration, steep sided holes and trenches in wafers, with aspect ratios of 20:1 or more. It was developed for microelectromechanical systems (MEMS), which require these features,… …   Wikipedia

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